JPS5870573A - 化合物半導体電界効果トランジスタ - Google Patents
化合物半導体電界効果トランジスタInfo
- Publication number
- JPS5870573A JPS5870573A JP56169145A JP16914581A JPS5870573A JP S5870573 A JPS5870573 A JP S5870573A JP 56169145 A JP56169145 A JP 56169145A JP 16914581 A JP16914581 A JP 16914581A JP S5870573 A JPS5870573 A JP S5870573A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- substrate
- compound semiconductor
- field effect
- electron affinity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
Landscapes
- Bipolar Transistors (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56169145A JPS5870573A (ja) | 1981-10-22 | 1981-10-22 | 化合物半導体電界効果トランジスタ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56169145A JPS5870573A (ja) | 1981-10-22 | 1981-10-22 | 化合物半導体電界効果トランジスタ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5870573A true JPS5870573A (ja) | 1983-04-27 |
JPH0328821B2 JPH0328821B2 (en]) | 1991-04-22 |
Family
ID=15881115
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56169145A Granted JPS5870573A (ja) | 1981-10-22 | 1981-10-22 | 化合物半導体電界効果トランジスタ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5870573A (en]) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4558337A (en) * | 1984-05-30 | 1985-12-10 | Texas Instruments Inc. | Multiple high electron mobility transistor structures without inverted heterojunctions |
JPS6146031A (ja) * | 1984-08-10 | 1986-03-06 | Sanyo Electric Co Ltd | 半導体積層構造 |
JPS62112378A (ja) * | 1985-11-12 | 1987-05-23 | Nippon Telegr & Teleph Corp <Ntt> | 電界効果トランジスタ |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8806466B2 (en) * | 2010-07-05 | 2014-08-12 | Panasonic Corporation | Program generation device, program production method, and program |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57180186A (en) * | 1981-04-30 | 1982-11-06 | Fujitsu Ltd | Semiconductor device and manufacturing method therefor |
-
1981
- 1981-10-22 JP JP56169145A patent/JPS5870573A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57180186A (en) * | 1981-04-30 | 1982-11-06 | Fujitsu Ltd | Semiconductor device and manufacturing method therefor |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4558337A (en) * | 1984-05-30 | 1985-12-10 | Texas Instruments Inc. | Multiple high electron mobility transistor structures without inverted heterojunctions |
JPS6146031A (ja) * | 1984-08-10 | 1986-03-06 | Sanyo Electric Co Ltd | 半導体積層構造 |
JPS62112378A (ja) * | 1985-11-12 | 1987-05-23 | Nippon Telegr & Teleph Corp <Ntt> | 電界効果トランジスタ |
Also Published As
Publication number | Publication date |
---|---|
JPH0328821B2 (en]) | 1991-04-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7687799B2 (en) | Methods of forming buffer layer architecture on silicon and structures formed thereby | |
US5831296A (en) | Semiconductor device | |
JPS60223171A (ja) | 電界効果トランジスタ | |
JP3259106B2 (ja) | 高電子移動度電界効果半導体装置 | |
JPS5870573A (ja) | 化合物半導体電界効果トランジスタ | |
WO2020009020A1 (ja) | トンネル電界効果トランジスタ | |
JPH0837292A (ja) | 電界効果型半導体装置 | |
JPS59184573A (ja) | 電界効果トランジスタ | |
JP3000489B2 (ja) | 応力補償型シュード・モルフィック高電子移動度トランジスタ | |
JPH0719888B2 (ja) | 電界効果型トランジスタ及びその製造方法 | |
JP2674490B2 (ja) | 電界効果トランジスタ | |
JPS624370A (ja) | 半導体素子 | |
JP2687937B2 (ja) | 電界効果トランジスタ | |
JPH0567056B2 (en]) | ||
JP3746303B2 (ja) | 電界効果トランジスタ | |
JPH1168087A (ja) | 共鳴トンネルトランジスタおよびその製造方法 | |
JP2725033B2 (ja) | 量子細線トランジスタ | |
JPH09270522A (ja) | 電界効果トランジスタ及びその製造方法 | |
JP2616634B2 (ja) | 電界効果トランジスタ | |
JP3299188B2 (ja) | 半導体装置 | |
JPH1168086A (ja) | 半導体装置 | |
JPH1050730A (ja) | トンネルトランジスタおよびその製造方法 | |
JPH0653253A (ja) | 電界効果トランジスタ | |
JPS61210678A (ja) | 化合物半導体装置 | |
JPS58145154A (ja) | 電界効果形半導体装置 |